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High Detail resin Raise3D
The High Detail resin by Raise3D is one of the brand's high quality general use photopolymers, together with the Standard resin. The High Detail resin stands out for its exceptional attributes, offering an unprecedented level of precision in visual prototypes and model designs. Parts 3D printed with this resin boast an exquisite matte apricot surface finish. The remarkable smoothness not only enhances the visual appeal but also streamlines multiple postprocessing techniques, such as painting and plating.
This specialized resin finds its niche across a spectrum of applications. Its forte lies in crafting ultra-high resolution and intricate prototypes and industrial parts. Moreover, the High Detail resin thrives in the creation of models destined for painting and plating or sculptures, ensuring that every delicate detail is captured with utmost precision. Whether for industrial or artistic pursuits, High Detail resin stands as the go-to choice, meticulously translating intricate designs into tangible, high-fidelity models.
The ideal equipment for the 3D printing of the Raise3D High Detail resin is the Raise3D DF2 solution comprising of the DF2 DLP 3D printer, the auto-feeding station, and the DF Wash and DF Cure post-processing devices. The Raise3D DF2 solution provides swift printing, seamless surfaces, accuracy, and dependability for engineering prototypes, aids in manufacturing, and low-volume production. Unlike the complex DLP process in other comparable systems in the market, the intelligent build plate, coupled with an RFID tag, and the straightforward operation of these machines streamline the entire printing, washing, and post-curing stages, guaranteeing uniformity and effectiveness.
The material's technical and safety datasheets can be found in the Downloads section. In the technical datasheet the user can read more about the material's properties as well as the recommended post-processing workflow.
High performance engineering resin with ABS-like properties and high impact and heat resistance.